Olympus MPlanFL N 100X Epi Objective | 0.90 NA, Infinity Corrected 16X LEICA >90% in visible band

>90% in visible band

this objective provides a large field of view for rapid navigation across wafer surfaces

Specification Details Model / Catalog Number Nikon CFI Apochromat TIRF 60X / MRD01691 Magnification 60X Numerical Aperture (NA) 1

75 at 20× — high numerical aperture for a multi-immersion objective

Specification Details Model / Catalog Number Nikon CFI SR HP Plan Apochromat Lambda S 100X / MRD73950 Magnification 100X Numerical Aperture (NA) 1

Olympus MPlanFL N 100X Epi Objective | 0.90 NA, Infinity Corrected 16X LEICA >90% in visible bandPremium 100 semi apochromatic objective with ultra high numerical aperture ideal for maximum magnification imaging and ultra fine detail observation in industrial microscopy. 100 Magnification, NA 0. 90 Ultra high numerical aperture for exceptional resolution at maximum magnification. Semi Apochromatic Correction Superior color correction and image quality across the visible spectrum. Plan Fluorite (MPLFLN) Optics Flat field imaging from center to