Zeiss Plan Neofluar 25x PH2 Multi Immersion Objective LONG WORKING DISTANCE π Rotatable wafer holder β
Description
π Rotatable wafer holder β allows precise angular orientation of the wafer during inspection
π¬ Olympus U-MDF3 Reflected Light Darkfield Mirror Cube β a half-mirror darkfield cube for Olympus rotatable cube turrets
Stereo microscopy and dissecting microscopy
β’ Embryo
integrated circuit inspection
Zeiss Plan Neofluar 25x PH2 Multi Immersion Objective LONG WORKING DISTANCE π Rotatable wafer holder βZEISS LD A PLAN 20X PH1 LWD OBJECTIVE RMS THREAD (M27 ADAPTER AVAILABLE UPON REQUEST) PH2 WATER, OIL OR GLYCERIN IMMERSION WORKING DISTANCE: 0. 21 MM NUMERICAL APERTURE: 0. 80 CATALOG NUMBER: 440545 CONDITION: EXCELLENT, LIKE NEW UNIVERSITY PURCHASE ORDERS ACCEPTED THANK YOU FOR VIEWING AND PLEASE FEEL FREE TO CALL OR EMAIL WITH ANY QUESTIONS
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